A ”workhorse” for high volume semiconductor mask manufacturing
The Micronic Mydata Omega6800-XT and Omega6080-XT laser pattern generators are designed for cost-effective production of mainstream semiconductor photomasks. The systems are the latest development of Micronic Mydata’s successful Omega6000 raster scan platform, used by leading mask manufacturers world-wide. The tool features higher throughput, as well as improved calibration
methods and diagnostics to further enhance the overall performance of the platform.
Omega6800/6080-XT product sheet
The Omega6800-XT is the choice for 130-250nm technology node photomasks and demanding image sensor applications.The acousto-optic beam control and a high-NA final lens allow very accurate patterning of mask features down below half-micron size. The system offers a high degree of flexibility between writing modes, allowing high-accuracy production of advanced photomasks and high-throughput writing of lower-end photomasks.
The Omega6800-XT also features the latest advances in ”mura” control to reduce systematic deviations on the photomask. Controlling “mura” is essential for applications where optical quality is
important, e.g. for CCD/CMOS image sensors for digital cameras and for Low Temperature Poly Silicon (LTPS) TFTLCD displays.
The Omega6080-XT is optimized for high-volume and fast turn-around production at 250nm and above technologies. The system offers very high throughput with production of up to 24 masks (6”) per day from a single tool.
Sub-micron resolution and very good CD and placement control make the Omega6080-XT the ideal tool for replacing older e-beam mask writers for mainstream photomask applications.