High throughput laser-based pattern generators for photomask manufacturing of advanced chips and image devices

The new Micronic Mydata Sigma7700 laser pattern generator operates with laser speed independent of data volume. Sigma offers a broad area of usage covering several technology nodes below 100nm with field-proven reliability and user-friendliness.

Sigma7700 takes best in class performance another step forward, with tighter specifications and new features that enhance photomasks patterning. Four-pass writing provides the highest accuracy and two-pass writing deliver the highest productivity. At the heart of the Sigma7700 is a third generation spatial light modulator (SLM) chip, with excellent accuracy and long-term stability. Coupled with an updated CCD camera, calibration quality and speed have been significantly enhanced.

The Sigma7700 is capable of printing the entire mask set at the 90nm technology node, and can handle non-critical photomasks down to the 22nm node. The tool is also well-suited for advanced image sensors requiring the ultimate in pattern accuracy. Sigma7700 writes a typical photomask layout in about 3 hours in four-pass mode, and has almost twice the productivity in two-pass mode with only a slight decrease in patterning performance. For the highest production flexibility, the Sigma7700 handles both writing modes, switching instantly under jobdeck control.

Sigma7700 is the ideal solution for 2nd layer patterning of advanced PSM applications, such as alternating aperture PSM with the optional high-precision alignment systems.

Sigma7700 product sheet